Ga2O3/Ag/Ga2O3-Laminated Film Fabricated at Room Temperature: Toward Applications in Ultraviolet Transparent Highly Conductive Electrodes

Ga2O3/Ag/Ga2O3-laminated films with high electrical conductivity and ultraviolet (UV) transparency were achieved by radio frequency magnetron sputtering at room temperature (RT) on quartz glass. The influence of annealing ambient the structural, optical properties investigated in detail. As increases, bandgap Ga2O3-laminated widens. exhibited good photoelectric performance a figure-of-merit (FOM) value 5.83 × 10−3 Ω−1, sheet resistance 12.55 Ω/sq, transmittance 95.15% 325 nm, an average 77.56% (250~300 nm). All these results suggest that RT-fabricated show great potential UV transparent conductive electrodes for optoelectronic devices flexible electronics.